龚兰新, 魏翠梅, 胡劲波, 李启隆. 阿霉素在纳米钴修饰电极上的电化学行为及其应用J. 药学学报, 2008, 43(3): 303-307.
引用本文: 龚兰新, 魏翠梅, 胡劲波, 李启隆. 阿霉素在纳米钴修饰电极上的电化学行为及其应用J. 药学学报, 2008, 43(3): 303-307.
GONG Lan-xin, WEI Cui-mei, HU Jin-bo, LI Qi-long. Electrochemical behaviour of the adriamycin on the cobalt nanoparticles modified ITO electrodeJ. Acta Pharmaceutica Sinica, 2008, 43(3): 303-307.
Citation: GONG Lan-xin, WEI Cui-mei, HU Jin-bo, LI Qi-long. Electrochemical behaviour of the adriamycin on the cobalt nanoparticles modified ITO electrodeJ. Acta Pharmaceutica Sinica, 2008, 43(3): 303-307.

阿霉素在纳米钴修饰电极上的电化学行为及其应用

Electrochemical behaviour of the adriamycin on the cobalt nanoparticles modified ITO electrode

  • 摘要: 采用NaBH4还原法制备了钴纳米粒,将其固定于氧化铟锡(ITO)电极上,首次制成了纳米钴修饰电极(NpCo/ITO),并研究了阿霉素(adriamycin,ADM)在NpCo/ITO上的电化学性质。用循环伏安法(CV)、扫描电子显微镜(SEM)和能量色散谱(EDS)等对纳米钴修饰电极表面进行了表征。在纳米钴修饰电极上,阿霉素(ADM)在0.01 mol·L-1 KH2PO4-K2HPO4溶液(pH 8.0)中,出现还原峰,峰电位为-0.67 V(vs Ag/AgCl),峰电流与ADM浓度在1.0×10-8~2.0×10-6 mol·L-1呈线性关系,检测限为5.0×10-9 mol·L-1。循环伏安法研究表明,该体系属于具有吸附性的不可逆过程,NpCo/ITO对ADM的电化学还原过程产生较大的促进作用。

     

    Abstract: A cobalt nanoparticles modified ITO electrode (NpCo/ITO) was prepared by casting cobalt nanoparticles onto ITO electrode and the cobalt nanoparticles were synthesized by NaHB4 reduction. The electrochemical behaviors of adriamycin (ADM) on NpCo/ITO were studied. The modified ITO electrode was characterized by cyclic voltammetry (CV), scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS). In a 0.01 mol·L-1 PBS (pH 8.0) buffer solution, a sensitive reduction peak of ADM was obtained. A linear relationship is held between the peak current and ADM concentration in the range of 1.0×10-8-2.0×10-6 mol·L-1 with detection of 5.0×10-9 mol·L-1 by cyclic voltammetry (CV) response. The reduction process was irreversible with adsorption at the NpCo/ITO electrode. The modified electrode showed an excellent electrocatalytic activity for the ADM electrochemical reduction.

     

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