柔红霉素在钴离子注入修饰电极上的电化学行为及其应用

王静; 胡劲波; 李启隆

柔红霉素在钴离子注入修饰电极上的电化学行为及其应用

Electrochemical behavior of daunorubicin at Co/GC ion implantation modified electrode and the application of the electrode

摘要

摘要: 目的研究柔红霉素在Co/GC离子注入修饰玻碳电极上的电化学行为及其应用。方法柔红霉素在0.05 mol·L^-1 Na₂HPO₄-KH₂PO₄溶液(pH 6.82)中，用Co/GC离子注入修饰电极进行伏安测定。结果得到一个良好的还原峰，峰电位为-0.60 V (vs SCE)。峰电流与柔红霉素的浓度在2.84×10^-8～1.42×10^-6 mol·L^-1和1.42×10^-6～1.28×10^-5 mol·L^-1呈线性关系，r分别为0.999 2和0.999 3，检出限为1.42×10^-8 mol·L^-1。用于注射液中柔红霉素的测定，回收率为95.8%～102.8%。用线性扫描、循环伏安法研究了柔红霉素的电化学行为及其机制。结论电极反应为具有吸附性质的准可逆过程，质子化的柔红霉素在电极表面得到2个电子和1个质子还原。离子注入电极对柔红霉素具有电催化活性。

Abstract: AimTo study the electrochemical behavior of daunorubicin at Co/GC ion implantation modified electrode. MethodsWith Co/GC ion implantation modified electrode as working electrode, daunorubicin was determined by voltammetry in 0.05 mol·L^-1 Na₂HPO₄-KH₂PO₄(pH 6.82) solution. ResultsA sensitive reductive peak of daunorubicin was obtained by linear sweep voltammetry. The peak potential was -0.60 V (vs SCE)。The peak current was proportional to the concentration of daunorubicin over the range of 2.84×10^-8-1.42×10^-6 mol·L^-1 and 1.42×10^-6-1.28×10^-5 mol·L^-1 with the detection limit of 1.42×10^-8 mol·L^-1。The reduction wave was applied to the determination of daunorubicin. The electrochemical behavior and reaction mechanism were studied by linear sweep and cyclic voltammetry. ConclusionThe reduction process was quasi-reversible with adsorption characteristics.

HTML全文

参考文献(0)

施引文献

资源附件(0)